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Proceedings Paper

Synchrotron Radiation X-Ray Lithography: Recent Results
Author(s): Jerome P. Silverman; Rolf P Haelbich; John M Warlaumont
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Paper Abstract

A beamline for making X-ray lithography exposures using synchrotron radiation has been built and is now in routine operation at Brookhaven National Laboratory. The beamline, its optics, and its control system are described, and results are presented showing the intensity and uniformity of the radiation at the wafer. Results of exposures in a variety of resists are shown and discussed.

Paper Details

Date Published: 19 March 1984
PDF: 10 pages
Proc. SPIE 0448, X-Ray Lithography and Applications of Soft X-Rays to Technology, (19 March 1984); doi: 10.1117/12.939206
Show Author Affiliations
Jerome P. Silverman, IBM Thomas J. Watson Research Center (United States)
Rolf P Haelbich, IBM Thomas J. Watson Research Center (United States)
John M Warlaumont, IBM Thomas J. Watson Research Center (United States)


Published in SPIE Proceedings Vol. 0448:
X-Ray Lithography and Applications of Soft X-Rays to Technology
Alan D. Wilson, Editor(s)

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