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Proceedings Paper

Making CGH By Using Electron Beam
Author(s): Yan Yingbai; Yu Dongxiao; Chin kuo-fan
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Paper Abstract

The Electron-beam Lithography is a newly developed microfabrication technique. The principle and technology of making CGH by E-beam were discussed. The influences of error on the E-beam Generated Holograms have been analysed. The experimental results of the differential filters and a CGH scatter-plate have also been presented.

Paper Details

Date Published: 15 January 1988
PDF: 5 pages
Proc. SPIE 0673, Holography Applications, (15 January 1988); doi: 10.1117/12.939045
Show Author Affiliations
Yan Yingbai, Tsinghua University (China)
Yu Dongxiao, Tsinghua University (China)
Chin kuo-fan, Tsinghua University (China)

Published in SPIE Proceedings Vol. 0673:
Holography Applications
Jingtang Ke; Ryszard J. Pryputniewicz, Editor(s)

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