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Proceedings Paper

Pulsed Laser Annealing Of Silicon And Metal/Silicon Systems
Author(s): E D'Anna; G Leggieri; A Luches; G Majni; M R Perrone
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Paper Abstract

Epitaxial regrowth of ion implanted silicon and formation of metal silicides through the reaction of Si single crystals with thin deposited metal (Pt, Pd, Cr, Mo, Ti) films was obtained with different (ruby, Nd:glass, excimer) pulsed laser sources. Temperature profiles and evolutions into the samples were calculated. It was found that partial and even complete reactions of the metal films with silicon can be obtained at laser fluences lower than those needed for melting of the materials. The morphology of the irradiated surfaces was studied with a scanning electron microscope. Formation of damage ripple patterns is discussed. Epit-axial regrowth and silicide formation without surface damage of the irradiated materials was obtained by using excimer lasers.

Paper Details

Date Published: 12 November 1986
PDF: 10 pages
Proc. SPIE 0668, Laser Processing: Fundamentals, Applications, and Systems Engineering, (12 November 1986); doi: 10.1117/12.938890
Show Author Affiliations
E D'Anna, University di Lecce (Italy)
G Leggieri, University di Lecce (Italy)
A Luches, University di Lecce (Italy)
G Majni, University di Modena (Italy)
M R Perrone, Universita di Modena (Italy)


Published in SPIE Proceedings Vol. 0668:
Laser Processing: Fundamentals, Applications, and Systems Engineering
Walter W. Duley; Robert W. Weeks, Editor(s)

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