Share Email Print

Proceedings Paper

Barrier Height of Thin-Film (25-200A) PtSi-Si Schottky Diodes
Author(s): W Cabanski; M Schulz
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

±We have performed a detailed study of the barrier height of PtSi/p-Si Schottky diodes with thicknesses ranging from 25 to 200Å. The hole photocurrent was measured by using irradiation through cooled (70K) narrow band (▵λ : 0,14μm) irinterference filters in the spectral range from 3,0 to 5,4 μm. The photocurrent is analysed as a function of the reverse bias voltage to determine the barrier height by the Schottky effect. The flat band barrier is determined to (1)BFB = 0,257 eV ± 8 meV independent of PtSi thickness. The scatter due to fabrication processes (sputtering or evaporating of Pt and annealing) is only + 7meV. The temperature dependence of the barrier follows the temperature variation of the Si bandgap in the range 20 to 100K. The tight pinning of the barrier height and the photo-excitation process are discussed in the light of interface states at the PtSi-Si interface.

Paper Details

Date Published: 22 November 1986
PDF: 4 pages
Proc. SPIE 0659, Materials Technologies for Infrared Detectors, (22 November 1986); doi: 10.1117/12.938556
Show Author Affiliations
W Cabanski, Universitat Erlangen-Nurnberg (Germany)
M Schulz, Universitat Erlangen-Nurnberg (Germany)

Published in SPIE Proceedings Vol. 0659:
Materials Technologies for Infrared Detectors
Jean Besson, Editor(s)

© SPIE. Terms of Use
Back to Top