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Proceedings Paper

A Four Electrode Electrostatic Lens With Small Chromatic And Spherical Aberrations Used In Submicron Lithography
Author(s): Gao Jie; Tian Jiahe; Wang Keli; Chang Huayi
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Paper Abstract

A novel four electrode lens system was designed on the basis of axial potential distribution analysis and a new electrostatic lens design guideline. The properties' of the lens are investigated and some general comparisons were made with two and three electrode lenses. It is shown that the four electrode lens is more flexiale and easier to approach the optimized axial potential distribution with simple electrode shapes. With the lens system a 1nA Ga ion beam current in a o.o73-o.o57uM beam spot could be obtained under the following conditions: 14-40Kv acceleration voltage, 4mrad object side acceptance half angle, 20uA/sr angular cur-rent density and 10eV beam energy spread. Experiments were carried out on a focusing ion beam system using the designed four electrode lens and theoretical calculations were confirmed by the experiment results.

Paper Details

Date Published: 31 October 1986
PDF: 3 pages
Proc. SPIE 0655, Optical System Design, Analysis, Production for Advanced Technology Systems, (31 October 1986); doi: 10.1117/12.938451
Show Author Affiliations
Gao Jie, Tsinghuai University (China)
Tian Jiahe, Tsinghuai University (China)
Wang Keli, Tsinghuai University (China)
Chang Huayi, Tsinghuai University (China)


Published in SPIE Proceedings Vol. 0655:
Optical System Design, Analysis, Production for Advanced Technology Systems
Robert E. Fischer; Philip J. Rogers, Editor(s)

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