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Proceedings Paper

Optimization Of Technology For The Systems Of Hard-Oxide Layers By Spectroscopic Methods
Author(s): K Fluck; G Szalai; J Kojnok; A Szasz
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Paper Abstract

The well-known evaporating process of hard-oxid coatings for laser mirrors has many uncontrolled parameters. This paper deals with the Ti0,-SiO2 hard-oxides systems. The optimization of technology is based on optical [transmission; reflection parameters etc), spectroscopical [soft x-ray emission spectroscopy /SXES/, x-ray fluorescence spectroscopy /XFS/], structural (x-ray diffraction /XRD/) and damage threshold /DT/ examinations. The Ti02 was found in the evaporated layers in two equilibrium phases - rutil and anatase - depending on the evapora-tion conditions. The rutil phase was better than the anatase considering the DT for mirrors at λ=]1064 µm. The explanation is based on the difference of the near-infrared absorbtion between rutil and anatase phase of Ti02.

Paper Details

Date Published: 13 October 1986
PDF: 9 pages
Proc. SPIE 0652, Thin Film Technologies II, (13 October 1986); doi: 10.1117/12.938394
Show Author Affiliations
K Fluck, Hungarian Optical Works Csorsz (Hungary)
G Szalai, Hungarian Optical Works Csorsz (Hungary)
J Kojnok, Eotvos University Muzeum (Hungary)
A Szasz, Eotvos University Muzeum (Hungary)

Published in SPIE Proceedings Vol. 0652:
Thin Film Technologies II
J. Roland Jacobsson, Editor(s)

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