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Proceedings Paper

Phase-Shifted Holographic Gratings For Distributed Feedback Lasers
Author(s): Gerhard Heise; Richard Matz; Ulrich Wolff
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Paper Abstract

The generation of phase-shifted gratings in InP for DFB lasers by holographic double exposure is described. The method is also suited for maskless laser activated etching. An estimation of the DFB laser threshold as compared to the ideal phase-shifted grating with constant amplitude is given.

Paper Details

Date Published: 3 November 1986
PDF: 7 pages
Proc. SPIE 0651, Integrated Optical Circuit Engineering III, (3 November 1986); doi: 10.1117/12.938134
Show Author Affiliations
Gerhard Heise, Siemens AG (Germany)
Richard Matz, Siemens AG (Germany)
Ulrich Wolff, Siemens AG (Germany)

Published in SPIE Proceedings Vol. 0651:
Integrated Optical Circuit Engineering III
Ralf Th. Kersten, Editor(s)

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