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Proceedings Paper

FZ growth of Ti3+:Al2O3 and its properties
Author(s): Shigeyuki Kimura; Yuzaburo Segawa; Nobuhiro Kodama; Kenji Kitamura; Kosuke Kosuda; Masayuki Tsutsumi
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Paper Abstract

Floating zone technique using an arc image furnace was applied for growing Ti3+ :Al203 single crystals with high doping levels. Up to 1 atom % of Ti was incorporated with relatively uniform concentration distribution. The disturbing optical absorption around 800 nm was found to increase parabolically with Ti concentration and its possible origin was suggested in relation to clustering in the crystal. Detection of no appreciable inclusions in the crystal eliminated the possibility of the scattering loss. The concentration quenching of the fluorescence lifetime was found to take place beyond 0.3 atom %.

Paper Details

Date Published: 6 April 1987
PDF: 5 pages
Proc. SPIE 0736, New Slab and Solid-State Laser Technologies and Applications, (6 April 1987); doi: 10.1117/12.938062
Show Author Affiliations
Shigeyuki Kimura, National Institute for Research in Inorganic Materials (Japan)
Yuzaburo Segawa, The Institute of Physical and Chemical Research (Japan)
Nobuhiro Kodama, National Institute for Research in Inorganic Materials (Japan)
Kenji Kitamura, National Institute for Research in Inorganic Materials (Japan)
Kosuke Kosuda, National Institute for Research in Inorganic Materials (Japan)
Masayuki Tsutsumi, National Institute for Research in Inorganic Materials (Japan)


Published in SPIE Proceedings Vol. 0736:
New Slab and Solid-State Laser Technologies and Applications
John M. Eggleston; Steven Guch, Editor(s)

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