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Proceedings Paper

A Simple, Very High Sensitivity Method For Measurement Of Ti Films For Integrated Optics Applications In Linb0[sub]3[/sub]
Author(s): C. De Bernardi; M. Meliga; G. Meneghini; S. Morasca
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Paper Abstract

This paper presents an experimental investigation on the characteristics and the capabilities of optical densitometry as a low cost, easy and non destructive technique to measure Ti film thickness. Optical density yields a sensitivity and a resolution equal or better than 3 Å and can be absolutely calibrated for the total metal content at given deposition conditions.

Paper Details

Date Published: 10 March 1987
PDF: 4 pages
Proc. SPIE 0704, Integrated Optical Circuit Engineering IV, (10 March 1987); doi: 10.1117/12.937151
Show Author Affiliations
C. De Bernardi, CSELT - Centro Studi e Laboratori Telecomunicazioni S.p.A. (Italy)
M. Meliga, CSELT - Centro Studi e Laboratori Telecomunicazioni S.p.A. (Italy)
G. Meneghini, CSELT - Centro Studi e Laboratori Telecomunicazioni S.p.A. (Italy)
S. Morasca, CSELT - Centro Studi e Laboratori Telecomunicazioni S.p.A. (Italy)


Published in SPIE Proceedings Vol. 0704:
Integrated Optical Circuit Engineering IV
Mark A. Mentzer; Sriram Sriram, Editor(s)

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