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Proceedings Paper

Pattern Inspection Techniques for SEM Image
Author(s): Toshimitsu Hamada; Asahiro Kuni; Kazushi Yoshimura; Hiroshi Makihira
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Paper Abstract

We have developed pattern inspection techniques for Integrated Circuit elements which use an SEMI (Scanning Electron Microscope). In this paper we will discuss the transformation of low SP1 ratio SEM image signals into binary values, detection techniques using the SEM to detect patterns on insulating materials, and detection algorithms for defects.

Paper Details

Date Published: 9 January 1984
PDF: 6 pages
Proc. SPIE 0432, Applications of Digital Image Processing VI, (9 January 1984); doi: 10.1117/12.936682
Show Author Affiliations
Toshimitsu Hamada, Hitachi Ltd. (Japan)
Asahiro Kuni, Hitachi Ltd. (Japan)
Kazushi Yoshimura, Hitachi Ltd. (Japan)
Hiroshi Makihira, Hitachi Ltd. (Japan)


Published in SPIE Proceedings Vol. 0432:
Applications of Digital Image Processing VI
Andrew G. Tescher, Editor(s)

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