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Proceedings Paper

Angle Resolved X-ray Photoelectron Spectroscopy Applied to Patchy Surfaces
Author(s): D. J. Pocker
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Paper Abstract

This paper reviews the principles of X-ray photoelectron spectroscopy (XPS) critical to the interpretation of angle resolved measurements. A simple model appropriate for a heterogeneous overlayer on a flat surface is presented. An outline of the quantitative determination of overlayer characteristics is also included. The technique described is applied to the naturally occurring layers on an air exposed surface of a silicon wafer.

Paper Details

Date Published: 12 August 1986
PDF: 10 pages
Proc. SPIE 0690, X-Rays in Materials Analysis: Novel Applications and Recent Developments, (12 August 1986); doi: 10.1117/12.936602
Show Author Affiliations
D. J. Pocker, IBM Corporation (United States)


Published in SPIE Proceedings Vol. 0690:
X-Rays in Materials Analysis: Novel Applications and Recent Developments
Thomas W. Rusch, Editor(s)

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