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Proceedings Paper

Ultrasensitive Elemental Analysis Of Solids By Sputter Initiated Resonance Ionization Spectroscopy
Author(s): J. E. Parks; H. W. Schmitt; G. S. Hurst; W. M. Fairbank
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Paper Abstract

This paper describes a new technique, Sputter-Initiated Resonance Ionization Spectroscopy (SIRIS)t, for ultrasensitive elemental analysis of solid samples. SIRIS combines resonance ionization spectroscopy and ion beam sputtering to provide analyses for all the elements except helium and neon with predicted sensitivities down to 1 part in 1012 in routine analysis, and greater for special uses. Basic concepts of this technology and new results in the development of the new SIRIS process and apparatus are presented.

Paper Details

Date Published: 19 October 1983
PDF: 10 pages
Proc. SPIE 0426, Laser-Based Ultrasensitive Spectroscopy and Detection V, (19 October 1983); doi: 10.1117/12.936233
Show Author Affiliations
J. E. Parks, Atom Sciences, Inc. (United States)
H. W. Schmitt, Atom Sciences, Inc. (United States)
G. S. Hurst, Atom Sciences, Inc. (United States)
W. M. Fairbank, Atom Sciences, Inc. (United States)

Published in SPIE Proceedings Vol. 0426:
Laser-Based Ultrasensitive Spectroscopy and Detection V
Richard A. Keller, Editor(s)

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