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Proceedings Paper

A Model For Polychromatic Photoresist Exposure In Optical Microlithography
Author(s): Giovanni Crosta
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Paper Abstract

Computer codes which simulate the photolithographic process are open loop problem solvers: given the inputs and parameters , a result is predicted . We suggest herewith that control theory may help in closing the feedback loop and allow process design and optimisation. As an example we deal with polychromatic exposure, which aims at reducing the standing wave effect. We consider resist activator dynamics and scalar field equation. A minimisation problem is defined , to which we apply complex Lagrangian theory. Optimal inputs can be searched for by an algorithm of which we give the flow chart.

Paper Details

Date Published: 28 November 1983
PDF: 10 pages
Proc. SPIE 0401, Thin Film Technologies I, (28 November 1983); doi: 10.1117/12.935517
Show Author Affiliations
Giovanni Crosta, Istituto di Cibernetica dell'Universita (Italy)

Published in SPIE Proceedings Vol. 0401:
Thin Film Technologies I
J. Roland Jacobsson, Editor(s)

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