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Proceedings Paper

The Fabrication Of Fine Lens Arrays By Laser Beam Writing
Author(s): Michael T. Gale; Karl Knop
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Paper Abstract

Lenticular arrays with near diffraction-limited performance have been generated by laser beam writing. A photoresist film is exposed in a line raster mode by scanning under an intensity-modulated focused laser beam; subsequent development of the resist film produces the desired lenticular relief profile. The writing of exposure patterns by raster scanning is analyzed, and it is shown that very precise positioning of each raster line is required to avoid unwanted modulation terms. A low cost xy positioning table with better than 20 nm dynamic positioning accuracy was constructed to satisfy this requirement, and has been used to generate high quality fine lenticular arrays with lenslets of widths down to 20 μm and relief depths up to about 4 μm.

Paper Details

Date Published: 26 October 1983
PDF: 7 pages
Proc. SPIE 0398, Industrial Applications of Laser Technology, (26 October 1983); doi: 10.1117/12.935397
Show Author Affiliations
Michael T. Gale, Laboratories RCA Ltd. (Switzerland)
Karl Knop, Laboratories RCA Ltd. (Switzerland)


Published in SPIE Proceedings Vol. 0398:
Industrial Applications of Laser Technology
William F. Fagan, Editor(s)

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