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Proceedings Paper

Automatic Inspection For In-Aligner Reticle Qualification
Author(s): H. Liff; R. Brauner; P. Esrig; J. Fee
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Paper Abstract

This paper describes work done at Contrex on the development and implementation of an automatic in-aligner reticle qualification system called the WaferVision 2000. This system performs reticle inspection for defects by automatic optical inspection of the photoresist patterns on a wafer printed by the reticle. The inspection is done by automatic comparison of the wafer pattern against a CAD derived design model.

Paper Details

Date Published: 7 November 1983
PDF: 4 pages
Proc. SPIE 0394, Optical Microlithography II: Technology for the 1980s, (7 November 1983); doi: 10.1117/12.935143
Show Author Affiliations
H. Liff, Contrex Inc. (United States)
R. Brauner, Contrex Inc. (United States)
P. Esrig, Contrex Inc. (United States)
J. Fee, Contrex Inc. (United States)


Published in SPIE Proceedings Vol. 0394:
Optical Microlithography II: Technology for the 1980s
Harry L. Stover, Editor(s)

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