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Proceedings Paper

Impact Of Mask Defects On Integrated Circuits Yield
Author(s): Jacques Le Carpentier
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Paper Abstract

The influence of mask defects on integrated circuits yield was studied by comparing the data given by an automatic mask inspection system to the die sort yield at probe test level. It was found that the yield losses due to mask defects can vary from a few % to more than 50 %, as a function of the type of defects, layer involved and defect size.

Paper Details

Date Published: 7 November 1983
PDF: 7 pages
Proc. SPIE 0394, Optical Microlithography II: Technology for the 1980s, (7 November 1983); doi: 10.1117/12.935137
Show Author Affiliations
Jacques Le Carpentier, R.T.C. La Radiotechnique Compelec (France)


Published in SPIE Proceedings Vol. 0394:
Optical Microlithography II: Technology for the 1980s
Harry L. Stover, Editor(s)

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