Share Email Print

Proceedings Paper

New Positive Resist Designed For Use In The Mid Ultraviolet
Author(s): R. F. Leonard; W. F. Cordes
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Waycoat WX-159 is a positive resist designed for use with optical aligners operating in the mid-UV (280-320 nm). Spectral data is presented indicating potential applications of WX-159 resist in the deep UV (220-280 nm) and near UV (330-400 nm) as well. Data are presented demonstrating the use of WX-159 in conventional UV as well as the mid-UV regime. The resist with both metal containing and metal ion free developers is characterized by two techniques: 1) contrast curve of remaining film thickness after development versus exposure energy, and 2) dissolution rate monitor comparison of exposed and unexposed WX-159 films. The impact of developer composition on resist profile is shown wherein WX-402 developer produces near vertical, flat topped, micron size WX-159 images.

Paper Details

Date Published: 7 November 1983
PDF: 9 pages
Proc. SPIE 0394, Optical Microlithography II: Technology for the 1980s, (7 November 1983); doi: 10.1117/12.935130
Show Author Affiliations
R. F. Leonard, Philip A. Hunt Chemical Corporation (United States)
W. F. Cordes, Philip A. Hunt Chemical Corporation (United States)

Published in SPIE Proceedings Vol. 0394:
Optical Microlithography II: Technology for the 1980s
Harry L. Stover, Editor(s)

© SPIE. Terms of Use
Back to Top