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Proceedings Paper

Registration Analysis Of 1/10 Steppers, 1/1 Orojections And Their Hybrid
Author(s): S. Uoya; W. Wakamiya; H. Abe; H. Nakata
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Paper Abstract

This paper describes the comparison of registration accuracies at device fabrication level, and the analysis of their registration errors, in 1/10 steppers(GCA 4800 DSW), 1/1 scanning projection aligns (Perkin-Elmer 140), and their hybrid. The registration accuracy (6R) was evaluated by fabricating an n-MOS test device of double poly-Si structure at 50 - 54 dies a 4"0 wafer. For the analysis of registration errors, five independent factors such as alignment error (6A), machine stability-and-compatibility error (6D), mask error (6M), mask thermal expansion error (6T), and residual error(6r), which are responsible for registration error, were quantitatively measured, including their long period variation.

Paper Details

Date Published: 7 November 1983
PDF: 7 pages
Proc. SPIE 0394, Optical Microlithography II: Technology for the 1980s, (7 November 1983); doi: 10.1117/12.935125
Show Author Affiliations
S. Uoya, Mitsubishi Electric Corporation (Japan)
W. Wakamiya, Mitsubishi Electric Corporation (Japan)
H. Abe, Mitsubishi Electric Corporation (Japan)
H. Nakata, Mitsubishi Electric Corporation (Japan)


Published in SPIE Proceedings Vol. 0394:
Optical Microlithography II: Technology for the 1980s
Harry L. Stover, Editor(s)

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