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Proceedings Paper

Printing Sub-Micron Features Beyond The Normal Ootical Resolution Limit Using A Multi-Level Resist Technique
Author(s): A Marsh
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Paper Abstract

Sidewall erosion in plasma etching is employed to obtain sub-micron features derived from 1.5 to gum sized features which are printed in a standard scanning UV projector. The smallest features reliably obtained are 0.3μm wide.

Paper Details

Date Published: 7 November 1983
PDF: 5 pages
Proc. SPIE 0394, Optical Microlithography II: Technology for the 1980s, (7 November 1983); doi: 10.1117/12.935118
Show Author Affiliations
A Marsh, Plessey Research (Caswell) Ltd. (United Kingdom)


Published in SPIE Proceedings Vol. 0394:
Optical Microlithography II: Technology for the 1980s
Harry L. Stover, Editor(s)

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