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Proceedings Paper

Influence Of Various Electro-Attractive Substituents On The Performances Of Acrylic Type Positive Resists In Microlithography.
Author(s): B. Serre; F. Schue; A. Eranian; E. Datamanti; J. c. Dubois; C. Montginoul; L. Giral
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Paper Abstract

The influence of two kinds of electro-attractive substituents on acrylic type positive resists upon the sensitivity on electrons or soft x-rays (λ = 13.34 Å) was studied. - Fluorine atoms were incorporated into the poly(alkylmethacrylate) ester chain. - Cyano group was substituted to methyl group bonded to the polymethacrylate quaternary carbon atom. The results were interpreted on the basis of the modified relationships of KU and SCALA, SPEARS and SMITH, giving the incident dose for an electron beam and x-ray irradiation respectively.

Paper Details

Date Published: 7 November 1983
PDF: 8 pages
Proc. SPIE 0393, Electron-Beam, X-Ray and Ion-Beam Techniques for Submicron Lithographies II, (7 November 1983); doi: 10.1117/12.935112
Show Author Affiliations
B. Serre, Universite des Sciences et Techniques du Languedoc (France)
F. Schue, Universite des Sciences et Techniques du Languedoc (France)
A. Eranian, Thomson C.S.F. (France)
E. Datamanti, Thomson C.S.F. (France)
J. c. Dubois, Thomson C.S.F. (France)
C. Montginoul, Universite des Sciences et Techniques du Languedoc (France)
L. Giral, Universite des Sciences et Techniques du Languedoc (France)


Published in SPIE Proceedings Vol. 0393:
Electron-Beam, X-Ray and Ion-Beam Techniques for Submicron Lithographies II
Phillip D. Blais, Editor(s)

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