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Proceedings Paper

Scanning Ion Beam Lithography For Sub-Micron Structure Fabrication
Author(s): J. R. A. Cleaver; P. J. Heard; H. Ahmed
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Paper Abstract

A scanning ion beam lithography instrument for the fabrication of sub-micron structures has been constructed and evaluated. It employs a tetrode gun, which accelerates the ions to the full beam voltage, and an einzel lens objective. Both gallium and gold-silicon liquid-metal sources have been used for resist exposure, and gallium sources have been used for direct selective ion implantation and for micromachining.

Paper Details

Date Published: 7 November 1983
PDF: 8 pages
Proc. SPIE 0393, Electron-Beam, X-Ray and Ion-Beam Techniques for Submicron Lithographies II, (7 November 1983); doi: 10.1117/12.935104
Show Author Affiliations
J. R. A. Cleaver, Cambridge University (England)
P. J. Heard, Cambridge University (England)
H. Ahmed, Cambridge University (England)


Published in SPIE Proceedings Vol. 0393:
Electron-Beam, X-Ray and Ion-Beam Techniques for Submicron Lithographies II
Phillip D. Blais, Editor(s)

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