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Proceedings Paper

Liquid Metal Ion Sources For Lithography Some Recent Advances
Author(s): P. D. Prewett; D. J. McMillan; D. K. Jefferies; G. L. R. Mair
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Paper Abstract

The high brightness liquid metal ion source (LMIS) is being used for ion beam lithography. Recent technological advances include a source for reactive metals and a source of 7Li+ for light ion beam lithography seems possible. Alloy sources for microfabrication by direct doping are being studied by several groups and a gold-silicon alloy source has also been used for lithography. Fundamental understanding of the LMIS is still advancing and the emission process is now generally held to be field evaporation. Recent energy spread measurements have revealed two modes of behaviour which may be linked to hydrodynamic effects.

Paper Details

Date Published: 7 November 1983
PDF: 9 pages
Proc. SPIE 0393, Electron-Beam, X-Ray and Ion-Beam Techniques for Submicron Lithographies II, (7 November 1983); doi: 10.1117/12.935103
Show Author Affiliations
P. D. Prewett, Dubilier Scientific Limited (England)
D. J. McMillan, UKAEA Culham Laboratory (United States)
D. K. Jefferies, UKAEA Culham Laboratory (United States)
G. L. R. Mair, Aston University (United States)


Published in SPIE Proceedings Vol. 0393:
Electron-Beam, X-Ray and Ion-Beam Techniques for Submicron Lithographies II
Phillip D. Blais, Editor(s)

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