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Proceedings Paper

A Lithography System For X-Ray Process Development
Author(s): W. Thomas Novak
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Paper Abstract

An x-ray system usable for process development and pilot line production is described, which utilizes technology based on a fixed palladium anode source. The alignment system employs three microscope objectives and optical channels to view the appropriate alignment target. The optical system has been optimized for use with circular fresnel zone plate targets. Alignment is electronically assisted using a detection system and associated electronics. The wafer stage is piezo motor driven with 6 degrees of freedom capable of placing the wafer under the mask within the allowable tolerance. The stage design incorporates a combination of flexures and air bearings to achieve the required precision. Essential features of the source, stage and alignment subsystems are described.

Paper Details

Date Published: 7 November 1983
PDF: 8 pages
Proc. SPIE 0393, Electron-Beam, X-Ray and Ion-Beam Techniques for Submicron Lithographies II, (7 November 1983); doi: 10.1117/12.935101
Show Author Affiliations
W. Thomas Novak, Micronix Corporation (United States)


Published in SPIE Proceedings Vol. 0393:
Electron-Beam, X-Ray and Ion-Beam Techniques for Submicron Lithographies II
Phillip D. Blais, Editor(s)

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