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Proceedings Paper

X-Ray Lithography Exposures Using Synchrotron Radiation
Author(s): Jerome P. Silverman; Rolf P. Haelbich; Warren D. Grobman; John M. Warlaumont
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Paper Abstract

A beamline for making X-ray lithography exposures using synchrotron radiation has been built and is now in operation at Brookhaven National Laboratory. The characteristics of synchrotron radiation and the reasons for using such a source are discussed. A description of the beamline and its control system is given, and results of early exposures are presented.

Paper Details

Date Published: 7 November 1983
PDF: 7 pages
Proc. SPIE 0393, Electron-Beam, X-Ray and Ion-Beam Techniques for Submicron Lithographies II, (7 November 1983); doi: 10.1117/12.935100
Show Author Affiliations
Jerome P. Silverman, IBM Thomas J. Watson Research Center (United States)
Rolf P. Haelbich, IBM Thomas J. Watson Research Center (United States)
Warren D. Grobman, IBM Thomas J. Watson Research Center (United States)
John M. Warlaumont, IBM Thomas J. Watson Research Center (United States)


Published in SPIE Proceedings Vol. 0393:
Electron-Beam, X-Ray and Ion-Beam Techniques for Submicron Lithographies II
Phillip D. Blais, Editor(s)

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