Share Email Print
cover

Proceedings Paper

Waferwriter: A Process-Compatible Electron Beam Direct Write System
Author(s): W. R. Livesay; J. S. Greeneich; J. E. Wolfe; R. J. Felker
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

A high current gaussian E-beam system is described which exhibits superior throughput and pattern dimensional control compared to reported shaped beam systems in the resolution ranges where direct writing is economically feasible. The Waferwriter' system is an ultra-high current density multiple gaussian beam system capable of exposing popular photoresists at higher rates than any reported shaped beam system in the 0.5 to 2μm feature size range. In addition, greater pattern line width control can be achieved than with shaped beam systems due to sharper beam edge gradients. Alignment and overlay are also improved due to the higher signal-to-noise ratio obtained with the brighter electron beam source.

Paper Details

Date Published: 7 November 1983
PDF: 6 pages
Proc. SPIE 0393, Electron-Beam, X-Ray and Ion-Beam Techniques for Submicron Lithographies II, (7 November 1983); doi: 10.1117/12.935094
Show Author Affiliations
W. R. Livesay, Electron Beam Corporation (United States)
J. S. Greeneich, Electron Beam Corporation (United States)
J. E. Wolfe, Electron Beam Corporation (United States)
R. J. Felker, Electron Beam Corporation (United States)


Published in SPIE Proceedings Vol. 0393:
Electron-Beam, X-Ray and Ion-Beam Techniques for Submicron Lithographies II
Phillip D. Blais, Editor(s)

© SPIE. Terms of Use
Back to Top