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Proceedings Paper

Selected Characterization Techniques For Optical Thin Films And Surfaces
Author(s): H. E. Bennett
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Paper Abstract

Important parameters for evaluating and characterizing thin films include (1) film thickness and index of refraction, (2) volume absorption coefficient of the film material, (3) surface absorption, (4) impurities and structure of the deposited film, (5) surface irregularities and defects, (6) light scattering, (7) adherence, hardness, and resistance to chemical attack, and (8) thickness nonuniformity and the resulting apparent change in optical figure. These parameters and some of the many ways to measure them will be discussed. To avoid systematic errors, it is advisable to use two or more independent techniques whenever possible.

Paper Details

Date Published: 8 November 1983
PDF: 7 pages
Proc. SPIE 0387, Technology of Stratified Media, (8 November 1983); doi: 10.1117/12.934990
Show Author Affiliations
H. E. Bennett, Naval Weapons Center (United States)

Published in SPIE Proceedings Vol. 0387:
Technology of Stratified Media
Roy F. Potter, Editor(s)

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