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Proceedings Paper

Vacuum Methods For Layer Deposition And Application To Device Structures
Author(s): Aristos Christou
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Paper Abstract

This paper reviews the deposition methode of single element metallic films, refractory films, silicides, vacuum epitaxy of metallic films, silicon and GaAs. The vacuum deposition techniques are: rf sputtering, magnetron sputtering, e-beam deposition, vacuum epitaxy and molecular beam epitaxy. Finally, the application of these films to microwave devices and integrated circuits is reviewed.

Paper Details

Date Published: 8 November 1983
PDF: 9 pages
Proc. SPIE 0387, Technology of Stratified Media, (8 November 1983); doi: 10.1117/12.934985
Show Author Affiliations
Aristos Christou, Naval Research Laboratory (United States)

Published in SPIE Proceedings Vol. 0387:
Technology of Stratified Media
Roy F. Potter, Editor(s)

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