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Proceedings Paper

Laser-Based Studies Of Chemical Vapor Deposition
Author(s): W. G. Breiland; M. E. Coltrin; Pauline Ho
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Paper Abstract

Pulsed laser-Raman spectroscopy and laser-excited fluorescence have been used to profile reactive species concentrations inside a chemical vapor deposition cell. Experimental data and theoretical calculations indicate that gas-phase chemical kinetics plays an important role in the deposition process.

Paper Details

Date Published: 9 August 1983
PDF: 6 pages
Proc. SPIE 0385, Laser Processing of Semiconductor Devices, (9 August 1983); doi: 10.1117/12.934969
Show Author Affiliations
W. G. Breiland, Sandia National Laboratories (United States)
M. E. Coltrin, Sandia National Laboratories (United States)
Pauline Ho, Sandia National Laboratories (United States)

Published in SPIE Proceedings Vol. 0385:
Laser Processing of Semiconductor Devices
Charles C. Tang, Editor(s)

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