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Proceedings Paper

Laser Plasma X-Ray Source Optimization For Lithography
Author(s): Harold M. Epstein; Philip J. Mallozzi; Bernerd E. Campbell
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Paper Abstract

The laser-plasma X-ray source has been evaluated for submicrometer X-ray lithography exposure machines. X-ray lithography systems based on commercially available lasers of reasonable cost appear to be feasible. Such machines would make full wafer exposures of silicon slices with a throughput consistent with current manufacturing requirements.

Paper Details

Date Published: 9 August 1983
PDF: 5 pages
Proc. SPIE 0385, Laser Processing of Semiconductor Devices, (9 August 1983); doi: 10.1117/12.934968
Show Author Affiliations
Harold M. Epstein, Battelle's Columbus Laboratories (United States)
Philip J. Mallozzi, Battelle's Columbus Laboratories (United States)
Bernerd E. Campbell, Battelle's Columbus Laboratories (United States)

Published in SPIE Proceedings Vol. 0385:
Laser Processing of Semiconductor Devices
Charles C. Tang, Editor(s)

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