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Proceedings Paper

Gas Immersion Laser Diffusion (GILDing)
Author(s): Robert J. Pressley
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Paper Abstract

Gas immersion laser diffusion (GILDing) is a novel method for doping semiconductor materials directly from a dopant-containing cover gas. It takes advantage both of the rapid diffusion of the dopant into a molten semiconductor and of the rapid liquid phase epitaxial regrowth of the same semiconductor as a high quality single crystal material.

Paper Details

Date Published: 9 August 1983
PDF: 2 pages
Proc. SPIE 0385, Laser Processing of Semiconductor Devices, (9 August 1983); doi: 10.1117/12.934943
Show Author Affiliations
Robert J. Pressley, XMR, Inc. (United States)


Published in SPIE Proceedings Vol. 0385:
Laser Processing of Semiconductor Devices
Charles C. Tang, Editor(s)

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