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Laser Induced Damage In The UltravioletFormat | Member Price | Non-Member Price |
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Paper Abstract
An ultra-violet laser damage and diagnostic facility has been set up. Laser induced damage threshold measurements have been made at 193nm and 248nm on a range of UV substrate/ window materials such as fused silica, MgF2, CaF2 and on various excimer laser mirrors with multi-layer dielectric coatings.
Paper Details
Date Published: 16 June 1983
PDF: 6 pages
Proc. SPIE 0369, Max Born Centenary Conf, (16 June 1983); doi: 10.1117/12.934418
Published in SPIE Proceedings Vol. 0369:
Max Born Centenary Conf
M. John Colles; D. William Swift, Editor(s)
PDF: 6 pages
Proc. SPIE 0369, Max Born Centenary Conf, (16 June 1983); doi: 10.1117/12.934418
Show Author Affiliations
S. S. Wiseall, Loughborough University of Technology (United Kingdom)
D. C. Emmony, Loughborough University of Technology (United Kingdom)
Published in SPIE Proceedings Vol. 0369:
Max Born Centenary Conf
M. John Colles; D. William Swift, Editor(s)
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