Share Email Print
cover

Proceedings Paper

Reflecting On Metalorganic Chemical Vapor Deposition (MOCVD)
Author(s): H. M. Manasevit
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Fourteen years have elapsed since our laboratory first reported the successful use of metalorganic-hydride combinations for producing epitaxial compound semiconductor films and alloys on insulating substrates and semiconductors. The technique has since been applied to the formation of a variety of III-V, II-VI, and IV-VI semiconductor compounds and alloys. More recently II-IV-V2 compounds were also produced. Successes in our laboratory and others and the application of the technique to devices continue to point to the process as the most viable one available today to produce large area growth of many types of films. Since much of the early work was performed in our laboratory, it may be of interest to this audience to become familiar with the steps that had to be climbed and the problems that were met in attaining the degree of quality now available in films grown by metal organic chemical vapor deposition (MO-CVD).

Paper Details

Date Published: 15 September 1982
PDF: 6 pages
Proc. SPIE 0323, Semiconductor Growth Technology, (15 September 1982); doi: 10.1117/12.934281
Show Author Affiliations
H. M. Manasevit, Rockwell International (United States)


Published in SPIE Proceedings Vol. 0323:
Semiconductor Growth Technology
Esther Krikorian, Editor(s)

© SPIE. Terms of Use
Back to Top