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Proceedings Paper

Growth And Characterization Of High Purity H[sub]2[/sub]-In-HCl-PH[sub]3[/sub] Vapor Phase Epitaxy (VPE) InP
Author(s): T. J. Roth; B. J. Skromme; T. S. Low; G. E. Stillman; L. M. Zinkiewicz
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Paper Abstract

Over the past decade indium phosphide has become one of the most intensively studied semiconducting materials. A high saturation velocity and large peak to valley ratio in its velocity field characteristic make it an attractive alternative for many high performance microwave electrical devices. Interest in the InP-InGaAsP alloy system has been further stimulated by the need for emitters and detectors in the 1.3 to 1.55 μm region where the performance of low loss silica fibers is optimal. In addition, an energy gap which is nearly ideal for conversion of solar radiation to electrical power makes it an interesting compound from that point of view. The ability to grow high purity epitaxial layers is important for the evaluation of fundamental material parameters and for controlling the doping level to optimize the performance of specific devices.

Paper Details

Date Published: 15 September 1982
PDF: 9 pages
Proc. SPIE 0323, Semiconductor Growth Technology, (15 September 1982); doi: 10.1117/12.934273
Show Author Affiliations
T. J. Roth, University of Illinois (United States)
B. J. Skromme, University of Illinois (United States)
T. S. Low, University of Illinois (United States)
G. E. Stillman, University of Illinois (United States)
L. M. Zinkiewicz, TRW Technology Research Center (United States)


Published in SPIE Proceedings Vol. 0323:
Semiconductor Growth Technology
Esther Krikorian, Editor(s)

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