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Proceedings Paper

Light Scattering In Leached Antireflection Surfaces
Author(s): Alexander J. Marker III; Lee Cook; Karl-Heinz Mader
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Paper Abstract

Chemical leaching processes used to produce antireflective surfaces on glass have been shown to exhibit extremely high laser damage thresholds. For evaluation of their utility in short wavelength operation, surface and bulk scattering effects in samples treated by two processes were investigated. The scattering effects observed in the two processes are compared with evaporated λ/4 interference films. The Neutral Solution process AR surface performs better at short wavelengths than the Minot etch/leached gradient AR surface produced on phase-separated glass because the light scattering associated with the Minot etch/ leached surface is high.

Paper Details

Date Published: 5 April 1983
PDF: 6 pages
Proc. SPIE 0362, Scattering in Optical Materials II, (5 April 1983); doi: 10.1117/12.934144
Show Author Affiliations
Alexander J. Marker III, Schott Optical Glass, Inc. (United States)
Lee Cook, Schott Optical Glass, Inc. (United States)
Karl-Heinz Mader, Schott Optical Glass, Inc, (United States)


Published in SPIE Proceedings Vol. 0362:
Scattering in Optical Materials II
Solomon Musikant, Editor(s)

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