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Proceedings Paper

Surface Microanalysis Characterization Of ThF4 Thin Films
Author(s): Ronald L. Lusk
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Paper Abstract

This study was to investigate the chemical composition of typical laser mirror coatings to locate and identify absorbing impurities in ThF4 thin films. Analysis by scanning Auger Electron Spectroscopy, X-Ray Photoelectron Spectroscopy and Secondary Ion Mass Spectroscopy showed an abnormally high oxygen content in the films which indicates the presence of water and may eliminate ThF4 as a potential coating material for HF (2.75 micron) laser systems.

Paper Details

Date Published: 15 September 1982
PDF: 5 pages
Proc. SPIE 0346, Thin Film Technologies and Special Applications, (15 September 1982); doi: 10.1117/12.933790
Show Author Affiliations
Ronald L. Lusk, Air Force Weapons Laboratory (United States)


Published in SPIE Proceedings Vol. 0346:
Thin Film Technologies and Special Applications
William R. Hunter, Editor(s)

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