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Proceedings Paper

Laser Chemical Vapor Deposition Using Cw And Pulsed Lasers
Author(s): Susan D. Allen
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Paper Abstract

Laser chemical vapor deposition (LCVD) uses a focused laser beam to locally heat the substrate and drive the CVD reaction. LCVD, therefore, shares the advantages of other laser processing techniques including spatial resolution and control and rapid heating and cooling rates. Characteristics of several types of LCVD films and experiments in optical monitoring of LCVD rates using both pulsed and cw laser are presented.

Paper Details

Date Published: 15 September 1982
PDF: 6 pages
Proc. SPIE 0346, Thin Film Technologies and Special Applications, (15 September 1982); doi: 10.1117/12.933787
Show Author Affiliations
Susan D. Allen, University of Southern California (United States)

Published in SPIE Proceedings Vol. 0346:
Thin Film Technologies and Special Applications
William R. Hunter, Editor(s)

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