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Proceedings Paper

Ultrafast High Resolution Contact Lithography Using Excimer Lasers
Author(s): K. Jain; C. G. Willson; B. J. Lin
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Paper Abstract

A new technique for fine-line, high-speed photolithography using ultraviolet excimer lasers is proposed and demonstrated. Absence of speckle and resolution down to 1000 line-pairs/mm are experimentally demonstrated. Using a XeCl laser at 308 nm and a KrF laser at 249 nm, excellent quality images are obtained by contact printing in two positive photoresists. These images are comparable to state-of-the-art lithography done with conventional lamps, the major difference being that the excimer laser technique is -2 orders of magnitude faster. Preliminary results on reciprocity behavior in several resists are also presented.

Paper Details

Date Published: 13 September 1982
PDF: 4 pages
Proc. SPIE 0334, Optical Microlithography I: Technology for the Mid-1980s, (13 September 1982); doi: 10.1117/12.933585
Show Author Affiliations
K. Jain, IBM Research Laboratory (United States)
C. G. Willson, IBM Research Laboratory (United States)
B. J. Lin, IBM Thomas J. Watson Research Center (United States)

Published in SPIE Proceedings Vol. 0334:
Optical Microlithography I: Technology for the Mid-1980s
Harry L. Stover, Editor(s)

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