Share Email Print

Proceedings Paper

Automatic Mask And Reticle Inspection System
Author(s): Hal Yang
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Automatic photomask inspection systems have been commercially available for a number of years. KLA Instruments has manufactured systems which utilize die-comparison to detect photomask defects. This paper describes some of the technical modifications and enhancements which augment the basic photomask inspection capability of a die-comparison system by adding the capability to inspect a single-die reticle against the data base which generated it.

Paper Details

Date Published: 13 September 1982
PDF: 3 pages
Proc. SPIE 0334, Optical Microlithography I: Technology for the Mid-1980s, (13 September 1982); doi: 10.1117/12.933579
Show Author Affiliations
Hal Yang, KLA Instruments Corporation (United States)

Published in SPIE Proceedings Vol. 0334:
Optical Microlithography I: Technology for the Mid-1980s
Harry L. Stover, Editor(s)

© SPIE. Terms of Use
Back to Top