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Proceedings Paper

Hybrid Lithography: Mixing Of 10:1 And 1:1 Projection Aligners
Author(s): Jerris H. Peavey; Stephen Cosentino; Charles Hamner
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Paper Abstract

The mixing of 10:1 direct step on wafer aligner to a 1:1 full mask projection aligner has often been proposed.1 This hybrid alignment scheme offers the advantages of excellent registration and high resolution found in the current steppers in combination with the established throughput and lower cost of the 1:1 projection aligners. This paper reports on fabrication of HMOS circuits using the hybrid technique at one critical layer. Full integration of the automatic global alignment features, field-by-field alignment, process control drop-ins and automatic framing has been accomplished. A technique for comparison of the registration between the conventional and hybrid process will be presented. Considerations of mask and reticle layout will be discussed. The influence of the additional time required for field-by-field alignment in a theoretical model will be presented.

Paper Details

Date Published: 13 September 1982
PDF: 9 pages
Proc. SPIE 0334, Optical Microlithography I: Technology for the Mid-1980s, (13 September 1982); doi: 10.1117/12.933571
Show Author Affiliations
Jerris H. Peavey, APRDL (United States)
Stephen Cosentino, APRDL (United States)
Charles Hamner, APRDL (United States)


Published in SPIE Proceedings Vol. 0334:
Optical Microlithography I: Technology for the Mid-1980s
Harry L. Stover, Editor(s)

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