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Proceedings Paper

Philips Wafer Stepper: Characterization And Processing Experience
Author(s): Roel Kramer; Rene Vervoordeldonk; Stefan Wittekoek; Rene Beem; Guido van der Looij
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Paper Abstract

The operation of the Philips Wafer stepper and the automated measurement techniques used to characterize it are reviewed. Characterization data in terms of registration accuracy, lens performance and throughput are presented. Finally, our processing experience with this stepper is described.

Paper Details

Date Published: 13 September 1982
PDF: 10 pages
Proc. SPIE 0334, Optical Microlithography I: Technology for the Mid-1980s, (13 September 1982); doi: 10.1117/12.933565
Show Author Affiliations
Roel Kramer, Philips Research Laboratories (Netherlands)
Rene Vervoordeldonk, Philips Research Laboratories (Netherlands)
Stefan Wittekoek, Philips Research Laboratories (Netherlands)
Rene Beem, Philips Research Laboratories (Netherlands)
Guido van der Looij, Philips Research Laboratories (Netherlands)

Published in SPIE Proceedings Vol. 0334:
Optical Microlithography I: Technology for the Mid-1980s
Harry L. Stover, Editor(s)

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