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Proceedings Paper

On The Mechanism Of The Lithographic Sensitivity Enhancement Of Obliquely Deposited Germanium Selenide Films
Author(s): T. Venkatesan; B. Wilkens
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Paper Abstract

Silver-sensitized obliquely deposited germanium selenide films have been shown to exhibit enhanced lithographic sensitivities. Rutherford backscattering (RBS) measurements of silver diffusion profiles indicate absence of any enhanced silver diffusion in the obliquely deposited films during the exposure process. From dissolution rate measurements and a quantitative measure of the silver left on the film at various stages, we conclude that the enhanced silver uptake in the oblique films during the sensitization process and the specific way the silver coats the columnar structure of the obliquely deposited films cause the sensitivity enhancement.

Paper Details

Date Published: 30 June 1982
PDF: 5 pages
Proc. SPIE 0333, Submicron Lithography I, (30 June 1982); doi: 10.1117/12.933429
Show Author Affiliations
T. Venkatesan, Bell Laboratories (United States)
B. Wilkens, Bell Laboratories (United States)

Published in SPIE Proceedings Vol. 0333:
Submicron Lithography I
Phillip D. Blais, Editor(s)

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