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Proceedings Paper

Plasma Sources For X-Ray Lithography
Author(s): S. M. Matthews; R. S. Cooper
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Paper Abstract

The Gas Puff Z-Pinch (GPZP) plasma X-ray source has a number of demonstrated advantages over conventional X-ray sources as applied to high throughput X-ray microlithography. The Physics International Company (PI) is presently constructing a GPZP X-ray source that has been designed for application to the microlithography industry.

Paper Details

Date Published: 30 June 1982
PDF: 6 pages
Proc. SPIE 0333, Submicron Lithography I, (30 June 1982); doi: 10.1117/12.933425
Show Author Affiliations
S. M. Matthews, Physics International Company (United States)
R. S. Cooper, Physics International Company (United States)


Published in SPIE Proceedings Vol. 0333:
Submicron Lithography I
Phillip D. Blais, Editor(s)

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