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Proceedings Paper

Quartz - The Ultimate Mask Material For Optical Lithography?
Author(s): Gilbert J. Zinsmeister
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Paper Abstract

Quartz has an extremely low thermal expansion and is fully transparent down to wavelengths below 200 nm. These properties allow users of quartz substrate masks to push optical lithography to its limits.

Paper Details

Date Published: 30 June 1982
PDF: 8 pages
Proc. SPIE 0333, Submicron Lithography I, (30 June 1982); doi: 10.1117/12.933410
Show Author Affiliations
Gilbert J. Zinsmeister, Balzers AG (Liechtenstein)

Published in SPIE Proceedings Vol. 0333:
Submicron Lithography I
Phillip D. Blais, Editor(s)

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