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Proceedings Paper

Application Of Methyl α-Chloroacrylate Copolymers As Electron Sensitive Positive Resists
Author(s): Juey H. Lai
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Paper Abstract

Poly(methly a-chloracrylate) (PMCA) is one of the vinyl polymers which is highly sensitive to high energy radiation. The G, value (defined as number of chain scission events per 100 ev of energy absorbed) of PMCA is 6.0 which is significantly higher than 1.6 of PMMA - the current standard e-beam resist. Used as a positive electron resist, the sensitivity of PMCA is considerably better than PMMA but less than one would expect from its high Gs' Such behavior can be attributed to: (a) the occurrence of non-negligible concurrent crosslinking in PMCA and (b) the poor solubility of PMCA. In the past, we have reported the synthesis, characterization and e-beam exposure results for the copolymers of MCA and several methacrylates, including methyl methacrylate (MMA), cyclohexyl methacrylate and n-hexyl methacrylate. In the present paper, the results of our recent studies for the copolymers of MCA and n-butyl methacrylate (BMA), of MCA and methacrylic acid (MAA) and the new results for the copolymers of MCA and MMA are presented. The optimization of copolymer composition and molecular weight, and the selection of developers based on solubility parameter concept are discussed in the paper. It has been found that both MCA/BMA and MCA/MMA copolymer resists possess submicron resolution and are significantly more sensitive than PMMA.

Paper Details

Date Published: 30 June 1982
PDF: 7 pages
Proc. SPIE 0333, Submicron Lithography I, (30 June 1982); doi: 10.1117/12.933405
Show Author Affiliations
Juey H. Lai, Honeywell Corporate Technology Center (United States)


Published in SPIE Proceedings Vol. 0333:
Submicron Lithography I
Phillip D. Blais, Editor(s)

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