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Proceedings Paper

Status Of Microstructure Fabrication
Author(s): John M. Warlaumont
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Paper Abstract

The present capabilities of microlithography are discussed, with emphasis placed on resolution and pattern distortion. The current limits of optical reduction lithography, electron beam lithography, and optical and x-ray proximity printing are presented. It is shown that currently the major factor limiting resolution in electron beam lithography is electron scattering in the resist and substrate. Recent progress in the theoretical understanding of this scattering limit is discussed, and new techniques for reducing the resolution degradation caused by this scattering are described.

Paper Details

Date Published: 24 March 1982
PDF: 11 pages
Proc. SPIE 0316, High Resolution Soft X-Ray Optics, (24 March 1982); doi: 10.1117/12.933143
Show Author Affiliations
John M. Warlaumont, IBM T.J. Watson Research Center (United States)

Published in SPIE Proceedings Vol. 0316:
High Resolution Soft X-Ray Optics
Eberhard Adolf Spiller, Editor(s)

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