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Proceedings Paper

X-Ray Ultraviolet Grating Measurements At LURE: Comparison With Electromagnetic Theory Predictions
Author(s): M. Berland; M. Neviere; J. Flamand
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Paper Abstract

An apparatus has been built at the LURE in view to permit reflectivity and efficiency measurements in the X-U.V. range for a large number of ontical systems*. The reflectometer exploits the opportunity offered at a synchrotron radiation center where a large choice of monochromators can be used like premonochromators delivering monochromatic light over the entire range from X-rays to U.V. This reflectometer has been designed to measure absolute reflectivity of mirrors, gratings and large 2d spacing structures usable in X-U.V. (natural and organic crystals, metallic multilayers, organic multilayers called Langmuir Blodgett layers). An example of tests on such structures are given in another paper of this sessionsl.Here we will be restricted to a general presentation of our reflectometer and applications to tests of new holographic gratings ion etched on glass substrate.

Paper Details

Date Published: 3 May 1982
PDF: 5 pages
Proc. SPIE 0315, Reflecting Optics for Synchrotron Radiation, (3 May 1982); doi: 10.1117/12.933003
Show Author Affiliations
M. Berland, Universite Paris Sud (France)
M. Neviere, Laboratoire d'Optique Electromagnetique (France)
J. Flamand, Jobin-Yvon (France)

Published in SPIE Proceedings Vol. 0315:
Reflecting Optics for Synchrotron Radiation
Malcolm R. Howells, Editor(s)

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