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Proceedings Paper

Chemical Vapor Deposited (CVD) Silicon Carbide Mirror Technology
Author(s): Richard E. Engdahl
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Paper Abstract

Chemical vapor deposited (CVD) silicon carbide (SiC) has been undergoing evaluation as a candidate mirror and mirror substrate material for several years. A summary of the test results is presented along with the material development work currently underway. The tests show that a super polished CVD-SiC surface is an outstanding mirror for some applications. For others, the preferred mirror is a composite produced by coating the polished CVD-SiC with an appropriate surface layer. An exceptional feature of the CVD SiC is its tolerance to cleaning, coating and recoating without damaging the super polish. Work to date has been on small, flat mirrors (less than 3" x 3"). For synchrotron radiation (SR) work, the need is for large mirrors (up to 10 x 40 inches) with aspheric figures. The current material development effort is concentrated on providing improved quality at the intermediate size of 41/2 x 22 inches. Future work will be devoted to establishing the technology of polishing and figuring, together with the scale-up to the 40 inch size.

Paper Details

Date Published: 3 May 1982
PDF: 8 pages
Proc. SPIE 0315, Reflecting Optics for Synchrotron Radiation, (3 May 1982); doi: 10.1117/12.932998
Show Author Affiliations
Richard E. Engdahl, Deposits and Composites Incorporated (United States)


Published in SPIE Proceedings Vol. 0315:
Reflecting Optics for Synchrotron Radiation
Malcolm R. Howells, Editor(s)

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