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Proceedings Paper

Precision Optical Wavefront Measurement
Author(s): Moshe Schaham
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Paper Abstract

A system has been developed for the purpose of real-time rapid measurement of the optical path difference (OPD) between a reference wavefront and a measuring wavefront of an interferometer by measuring the phase difference between them. The system is capable of measuring accurately OPDs represented by interference patterns with any shape and degree of complexity within the spatial resolution limits of the detector. The interference pattern of the two wavefronts is modulated so that any given point in the interference plane has a sinusoidally varying light intensity with a phase that is proportional to the OPD between the two wavefronts. The individual diodes of an array camera detect the varying light intensity in the interference plane. The output voltage of each diode is digitized and stored. The phase is then computed from these data, and processed to obtain the OPD, peak-to-valley (P-V), and root-mean-square (rms) values of the measured wavefront.

Paper Details

Date Published: 31 March 1982
PDF: 9 pages
Proc. SPIE 0306, Contemporary Methods of Optical Fabrication, (31 March 1982); doi: 10.1117/12.932748
Show Author Affiliations
Moshe Schaham, Zygo Corporation (United States)


Published in SPIE Proceedings Vol. 0306:
Contemporary Methods of Optical Fabrication
Charles L. Stonecypher, Editor(s)

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