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Proceedings Paper

Black silicon created by interfered femtosecond laser illumination
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Paper Abstract

A periodic parallel microgrooves on the silicon substrate with 2.5 um spacing covered by various nanostructures can be fabricated by using the interfered femtosecond laser illumination. The morphology created by this approach is apparently different from the common method using the femtosecond laser and sulfur hexafluoride (SF6). However, the treated silicon area could tremendously reduce the reflection from the surface. The reflectance of the structured surface is around 5% throughout the visible to near IR (1.1 um) despite of the viewing angle, which is comparative. Furthermore, the effect of the reflectance reduction is weaker but still obvious when wavelength is beyond 1.1 um, which is believed to be able to extend to the mid IR range.

Paper Details

Date Published: 15 October 2012
PDF: 6 pages
Proc. SPIE 8497, Photonic Fiber and Crystal Devices: Advances in Materials and Innovations in Device Applications VI, 84970W (15 October 2012); doi: 10.1117/12.932230
Show Author Affiliations
Chao Wang, The Pennsylvania State Univ. (United States)
Chih-Min Lin, The Pennsylvania State Univ. (United States)
Shizhuo Yin, The Pennsylvania State Univ. (United States)
Paul Ruffin, U.S. Army Aviation and Missile Research, Development and Engineering Ctr. (United States)
Christina Brantley, U.S. Army Aviation and Missile Research, Development and Engineering Ctr. (United States)
Eugene Edwards, U.S. Army Aviation and Missile Research, Development and Engineering Ctr. (United States)


Published in SPIE Proceedings Vol. 8497:
Photonic Fiber and Crystal Devices: Advances in Materials and Innovations in Device Applications VI
Shizhuo Yin; Ruyan Guo, Editor(s)

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