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Proceedings Paper

Cleaning Of Chromium On Glass Photomasks And Reticles
Author(s): David L. Angel; Paul H. Johnson; Scott Ashkenaz
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Paper Abstract

Solvent and plasma cleaning of RF sputtered, DC sputtered, and vacuum evaporated chromium-chrome oxide films on soda-lime glass substrates was investigated. One-cycle cleaning was evaluated using KLA automatic inspection. Long-term (eleven-cycle) effects on critical dimension, optical density and reflectivity by each process were measured. Deposition type had no effect on cleaning efficiency, although each did show long term effects on linewidth and optical parameters. RF sputtered chrome reflectivity increased drastically with all types of cleaning. Chrome lines grew, as did the optical density. DC sputtered chrome demonstrated a decrease in density in some cleaning methods, while vacuum evaporated films varied in linewidth.

Paper Details

Date Published: 28 July 1981
PDF: 8 pages
Proc. SPIE 0275, Semiconductor Microlithography VI, (28 July 1981); doi: 10.1117/12.931894
Show Author Affiliations
David L. Angel, American Microsystems, Inc. (United States)
Paul H. Johnson, American Microsystems, Inc. (United States)
Scott Ashkenaz, American Microsystems, Inc. (United States)


Published in SPIE Proceedings Vol. 0275:
Semiconductor Microlithography VI
James W. Dey, Editor(s)

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